Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
S. Seo, B. C. Yeo, S. S. Han, C. M. Yoon, J. Y. Yang, J. Yoon, C. Yoo, H.-j. Kim, Y.-b. Lee, S. J. Lee, J.-M. Myoung, H.-B.-R. Lee, W.-H. Kim, I.-K. Oh, and H. Kim
- Journal : ACS Applied Materials & Interfaces
- Vol. : 9
- Page : 13625-13630
- Year : 2017